Deposit+TMX+Monolayer+on+Silicon

N-Trimethoxysilylpropyl-N,N,N-trimethylammonium chloride or TMX is a solution that is used in conjunction witht he APTES solution to loosen the positive hold that APTES has on the DNA. You must learn how to deposit this solution on silicon. This is the only solution that has been mixed with APTES itself. The process of depositing TMX is exactly the same as APTES only when it is being deposited **by itself**. Otherwise, you must put the APTES and TMX in proportions with each other, for example you always want a total of 20 µL of solution, as this is the optimum amount.

1.) First try depositing 4 µL of APTES with 16 µL of TMX in depostion process, instead of purely 20 µL of APTES or TMX

2.) Then try 8 µL of APTES with 12 µL of TMX

3.) Afterwards, try 10 µL of each.

4.) Try depositing 12 µL of APTES with 8 µL of TMX

See what happens to the DNA in each proportion, and compare them to each other.

This is the structure of a TMX molecule.



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Other Milestone - Deposit PEG monolayer on Silicon

Other Milestone - Deposit the APTES monolayer on Silicon