Deposit+PEG+Solution+monolayer

PEG solution is a neutral molecule that can be used to offset the strong positive force of APTES solution. PEG stands for Poly(ethylene glycol). This is its structure.



There are two different processes of depositing PEG solution on silicon.

1.) The first is exactly like the APTES deposition process, except with PEG solution, and the deposition time for PEG is 1 to 2 hours instead of 10 to 15 minutes.

2.) Deposit 2 mL of **dry Toluene** and 40 μL of PEG into a vial. Dry simply means there's no water in it, but it is still a liquid. Then deposit 10 μL of HCL to act as a catalyst for the reaction.Finally, submerge the silicon wafer into the vial for 18 to 22 hours. Afterwards, get rid of the solution and rinse and dry the wafer.

Next Milestone - Make a Contact Angle on Surface

Other Milestone - Deposit the APTES monolayer on Silicon

Other Milestone - Deposit TMX monolayer on Silicon